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Microsystems Fabrication Clean Room
- Clean room facilities of 1000 square foot Class 100 &
2000 square foot Class 1000 for electronics, sensors, and MEMS
- STS ICP & RIE deep etcher and 9 PVD rigs with high temperature capability
- Full MEMS processing with photomask aligners & wet chemical etching stations
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SiC Chemical Vapor Deposition (CVD) Epitaxial Growth Laboratory
- Accommodate a single wafer up to 3" in diameter, or multiple smaller wafers
- Operate at low growth pressures at growth temperatures of 1600° C.
- Achieved growth rate of 4 µm/hr.
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Microdevices Characterization Facilities
- Scanning Electron Microscope with EDAX
- Scanning Auger Electron Spectroscopy
- X-ray Photoelectron Spectroscopy (XPS)
- Thin film sensor testing facilities
- High temperature packaging facilities
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