SiC CVD Epitaxial Growth Lab
2 state-of-the-art CVD systems: Emcore Discovery 75 vertical-flow system and Aixtron 200/4HT horizontal-flow system.
Accommodate a single wafer up to 3" in diameter, or multiple smaller wafers.
Operate at low growth pressures at growth temperatures of 1600° C.
Achieved growth rate of 4 µm/hr.
Overview
Microsystems Fabrication Clean Room
SiC CVD Epitaxial Growth Lab
Microdevices Characterization Facilities
Controls Development and Simulation Lab
Piloted Control Evaluation Facility
Real-time Vehicle Health Management Testbed
Actuator Development Lab
responsible official
site maintenance
mary zeller
edmond wong