Facilities Instrumentation and Controls Division
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SiC CVD Epitaxial Growth Lab

lab photo

  • 2 state-of-the-art CVD systems: Emcore Discovery 75 vertical-flow system and Aixtron 200/4HT horizontal-flow system.
  • Accommodate a single wafer up to 3" in diameter, or multiple smaller wafers.
  • Operate at low growth pressures at growth temperatures of 1600° C.
  • Achieved growth rate of 4 µm/hr.



Overview
Microsystems Fabrication Clean Room
SiC CVD Epitaxial Growth Lab
Microdevices Characterization Facilities
Controls Development and Simulation Lab
Piloted Control Evaluation Facility
Real-time Vehicle Health Management Testbed
Actuator Development Lab
responsible official
site maintenance
 mary zeller
 edmond wong