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Structures and Materials Division Research and Technology Directorate NASA Glenn Research Center

Analytical Science Group
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Analytical Chemistry
Electron Optics
Metallography
XRay Diffraction
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Analytical Chemistry
Ultraviolet/Visible Spectrophotometer: Instrumentation
Shimadzo Model UV-160
  • Elemental analysis
  • Sensitivity varies according to the element being analyzed
  • Precision is generally close to 1% relative, depending on the element being analyzed
  • In the absence of interferences, accuracy is aproximately 1 to 2% relative
  • Sample Considerations
    • Desired sample size is 1-2 grams
    • Samples are acceptable in powder, chip, granule, turning, or thin sheet form
    • Rod samples should be cut to ~1/16 inch thickness prior to submission
  • Typical Application
    • Determination of refractory elements W, Hf, and Zr in various materials
    • Analysis of Si in aqueous solutions and oxide glasses
Technician operating the Shimadzo Model UV-160
 
Above: Technician operating the Shimadzo Model UV-160
 

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Examples
For further information please contact Dereck Johnson
Capabilities
Atomic Absorption lab and equipment
Atomic Absorption
ICP operator and equipment
Inductively Coupled Plasma Atomic Emission Vacuum Spectrometer
CS-444LS unit in the Interstitial Gas Analysis lab
Interstitial Gas Analysis
C/S Determination
N/O Determination in the Interstitial Gas Analysis lab
Interstitial Gas Analysis
N/O Determination
CS-444LS unit in the Interstitial Gas Analysis lab
Wet Chemistry
CS-444LS unit in the Interstitial Gas Analysis lab
X-Ray fluorescence
Operator adjusting spectrophotometer
Ultraviolet/Visible Spectrophotometer
Phased extraction equipment
Phase Extraction


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Last Updated: May 13, 2008